
Vacuum Vapor Deposition /Magnetron Sputtering Machines That Can Produce ETL, Htm and ...
Hangzhou Zhongneng Photoelectricity Technology Co., Ltd.- Type:Vacuum Die Casting
- Coating Method:Multi-Source Evaporation Coating
- Rotating Substrate Table:4 Pieces of 100*100mm Substrates (Can Be Customize
- Transport Package:Wooden Box Shockproof
- Specification:1100*780*1800mm
- Trademark:PEROVS
Base Info
- Model NO.:ZHDS400
- Origin:Hangzhou
- Production Capacity:60 Sets,Year
Description
Basic Info.
Model NO. ZHDS400 Origin Hangzhou Production Capacity 60 Sets/YearProduct Description
Vacuum Vapor Deposition MachineProduct Overview
Vacuum vapor deposition, or vapor deposition for short, is the process of evaporating the coating material (or film material) and vaporizing it under vacuum conditions using certain heating and evaporation methods, and the particles fly to the surface of the substrate to coalesce into a film. Vapor deposition is an early and widely used vapor deposition technology, which has the advantages of simple film formation method, high film purity and denseness, unique film structure and performance, etc.

Product Features
(1) The square vacuum cavity adopts the front sliding door and the back door, and the front and rear doors are equipped with observation windows
(4) The front and rear doors are equipped with observation window panels, of which the front door is made of aluminum alloy.
(5) 2 spare CF35 flange connections.
(6) The top of the vacuum chamber is installed with a set of multi-functional water-cooled sample table and electric sample tray flap.
(7) 2 sets of metal source components (including electric baffle), 2 sets of organic source components (including electric baffle), 1200L/S turbomolecular pump vacuum pump unit and 3 sets of water-cooled film thickness probes, 2 sets of lighting and baking systems are installed at the bottom of the vacuum chamber; among them, the lighting and baking devices are easy to replace and not easily covered by the metal ash on the steam.
(8) Cavity leakage rate: ≤1X10-11Pa.m3/S. No-load ultimate vacuum: less than 2*10-7Torr, working vacuum: less than 5×10-4Pa.
(9) Vacuum chamber sample stage with water cooling and rotating function;
(10) Pumping rate: less than 20 minutes from atmosphere to 5*10-4Pa after filling dry air or nitrogen;
(11) Integrated design of equipment, small footprint, favorable price, stable performance, low cost of use and maintenance.
Functional parameters
1.Model: ZHDS400
2. Coating method: multi-source evaporation coating
3. Vacuum chamber structure: square box type front and back door; equipped with glove box
4. Vacuum chamber size: L400×W440×H450mm
5. Rotating substrate table: 4 pieces of 100*100mm substrates (can be customized)
6. Substrate table lift: manually adjust the lift height 150-300mm
7.Film thickness unevenness: ≤±5.0%
8. Evaporation source: 2 groups of metal source, 2~4 groups of organic source
9. Footprint: Main machine L1100×W780×H1800mm, glove box size customized
10. Total power: ≥10KW
Applications
1. Specially used in the laboratories of materials departments of some universities in China.
2. Suitable for laboratory preparation of metal monolithic film, semiconductor film, organic film, also can be used for production line pre-process test, etc..
3. Suitable for evaporation coating and glove box environment organic integration, to achieve evaporation coating, packaging, testing and other processes seamlessly, widely used in calcium titanite solar cells / OPV organic solar cells and OLED thin film and other research systems, etc.


